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Daniel Lundin is a Senior Associate Professor and the Head of the Coatings & Plasma Physics Division at Linköping University. He focuses on developing and characterizing plasma discharges, particularly in the fascinating thin film plasma deposition technique known as High Power Impulse Magnetron Sputtering (HiPIMS). Since obtaining his Ph.D. from Linköping University in 2010, he has worked at prestigious institutions including the Royal Institute of Technology (KTH), Kiel University in Germany, and the National Center for Scientific Research (CNRS) / Paris-Saclay University in France. He is a co-founder of the Swedish thin film technology company Ionautics and has made significant contributions to the field, publishing a book on HiPIMS in 2020. His current research emphasizes plasma process control in film deposition using reactive gases, where he has discovered innovative techniques for stable and repeatable high-rate deposition of compound coatings. Lundin is also interested in non-invasive process diagnostics that facilitate real-time process characterization and believes that digital tools will revolutionize thin film deposition in line with the Industry 4.0 concept.
Linköping University • Linköping, Sweden
Leading research in plasma discharges and thin film deposition techniques, specifically HiPIMS.
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