Generate a tailored SOP for Dr. Harm Knoops. Improve your application with a focused, well-structured draft.
Harm Knoops is a part-time Assistant Professor in the Department of Applied Physics at Eindhoven University of Technology (TU/e), specializing in Plasma and Materials Processing. Additionally, he serves as an Atomic Scale Segment Specialist at Oxford Instruments Plasma Technology (OIPT). His research focuses on the plasma-based synthesis of thin films and on advanced diagnostics to enhance and develop plasma Atomic Layer Deposition (ALD) techniques. Notably, he has contributed to recent advancements in applying RF substrate biasing in plasma ALD growth of 2D-MoS2, achieving significant recognition in his field. Knoops aims to deepen the understanding of plasma processes, particularly related to atomic layer etching (ALE) and its applications in growing 2D materials. He has authored 40 published papers in peer-reviewed journals, including 9 first-author papers and 1 review. His H-index is 22, with 1126 citations, highlighting the impact of his contributions to the academic community. Knoops completed his PhD in Applied Physics at Eindhoven University of Technology in 2011, focusing on Atomic Layer Deposition mechanisms in 3D-integrated micro-batteries, and has since held post-doctoral positions related to plasma processing and solar cell ALD before joining OIPT.
Eindhoven University of Technology • Eindhoven
Part-time Assistant Professor focusing on Plasma and Materials Processing.
Oxford Instruments Plasma Technology • Eindhoven
Specialist working to improve and advance atomic scale processes for applications.
Specific departments like Industrial Design require a portfolio. Programs like Data Science and AI require a GRE-General test for certain international backgrounds.