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John G. Ekerdt is a Professor and holds the Dick Rothwell Endowed Chair in the Department of Chemical Engineering at the University of Texas at Austin. He serves as the Associate Dean of the Cockrell School of Engineering. His research focuses on chemical vapor deposition growth chemistry related to silicon-germanium compound semiconductors and crystalline thin films. He is particularly interested in the dynamics of growth surfaces and employs surface science probes as well as nonlinear optical spectroscopy to study the influence of alloy composition and dopants on thin film growth kinetics. Through his research, Ekerdt aims to understand nucleation and growth processes in nanostructured materials and explores the structure-property relationships within these systems. He collaborates extensively with faculty in chemical engineering, physics, and electrical engineering, as well as with industry researchers. Ekerdt is committed to advancing applications in electronic materials, energy sensors, and beyond.
General requirements for the Graduate School at UT Austin apply to all programs unless otherwise specified.