Dr. Rahul Panat

Assistant Professor

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Biography

Rahul Panat received his M.S. in Mechanical Engineering from the University of Massachusetts, Amherst and his Ph.D. in Theoretical Applied Mechanics from the University of Illinois at Urbana-Champaign. Prior to his academic career, he worked at Intel Corporation in Chandler, AZ, for a decade focusing on microprocessor manufacturing research and development from 2004 to 2014. His work at Intel encompassed the research generation of high-density interconnects, thinning silicon, 3-D packaging, and lead-free halogen-free integrated circuits. He received several awards for his innovations at Intel, including the development of manufacturing processes for the world’s first fully green integrated circuit chip in 2007. He transitioned into academia in 2014 at Washington State University before joining Carnegie Mellon University in 2017. At Carnegie Mellon, Professor Panat focuses on micro-scale additive manufacturing, bioelectronics, flexible printed microelectronics, and advanced energy materials. His research addresses fundamental scientific knowledge and engineering breakthroughs for important applications, such as mimicking natural processes for developing innovative manufacturing methods.

Research Interests

Awards

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Lean Six Sigma Green Belt Certification

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Divisional Recognition Award

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Divisional Recognition Award

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Technology Manufacturing Group (TMG) Excellence Award

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Divisional Recognition Award

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Henry L. Langhaar Graduate Award

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Stanley J. Weiss Outstanding Dissertation Award

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Materials Research Society (MRS) Gold Medal

Requirements for Carnegie Mellon University

Doctorate Program
Requirements
GPA Requirement
Required:3.5
GRE General
Verbal
Required:158
Quantitative
Required:149
Analytical Writing
Required:4
Overall
Required:4
Prerequisites
Bachelor's degree in Psychology or related field Research experience/publications
Application Checklist
  • Online application
  • Statement of Purpose
  • Three letters of recommendation
  • Transcripts
  • GRE scores (optional but reported in profile)
  • English Proficiency (TOEFL/IELTS/Duolingo)
Specialization Notes

Admission is extremely competitive with no strict GPA cut-offs; holistic review is used.