Interference Lithography Professors in Global

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Thomas Aarøe Anhøj
Technical University of Denmark Denmark
photo lithography
wet chemistry lithography
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Jens Hemmingsen
Technical University of Denmark Denmark
photo lithography
wet chemistry lithography
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Elena Khomtchenko
Technical University of Denmark Denmark
photo lithography
wet chemistry lithography
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Thomas Pedersen
Technical University of Denmark Denmark
photo lithography
wet chemistry lithography
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Matthias Keil
Technical University of Denmark Denmark
wet chemistry lithography
photolithography
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Martin Maldovan
Georgia Institute of Technology United States of America
interference lithography
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John Doherty
Pennsylvania State University United States of America
interference suppression
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Michael Zoltowski
Purdue University United States of America
interference suppression
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Ruggero Verre
Chalmers University of Technology Sweden
laser lithography
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Dmitry Morozov
University of Glasgow United Kingdom
quantum interference
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Sara Sangtarash
University of Warwick United Kingdom
quantum interference
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Holger Mueller
University of California, Berkeley United States of America
quantum interference
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Raka Ahmed
University of Copenhagen Denmark
quantum interference
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Harry Anderson
University of Oxford United Kingdom
quantum interference
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Kevin Resch
University of Waterloo Canada
quantum interference
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Christopher Ober
Cornell University Netherlands
lithography
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Annie Johnston
University of Texas at Austin United States of America
lithography
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Karen Birkelund
Technical University of Denmark Denmark
lithography
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Mark Horn
Pennsylvania State University United States of America
lithography
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Millie Mitchell
University of New South Wales Australia
lithography
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William Oldham
University of California, Berkeley United States of America
lithography
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