Extreme Ultraviolet Lithography Professors in Global

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Thomas Aarøe Anhøj
Technical University of Denmark Denmark
photo lithography
wet chemistry lithography
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Jens Hemmingsen
Technical University of Denmark Denmark
photo lithography
wet chemistry lithography
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Elena Khomtchenko
Technical University of Denmark Denmark
photo lithography
wet chemistry lithography
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Thomas Pedersen
Technical University of Denmark Denmark
photo lithography
wet chemistry lithography
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Matthias Keil
Technical University of Denmark Denmark
photolithography
wet chemistry lithography
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Amy Stevens
University of Saskatchewan Canada
ultrafast laser spectroscopy
ultrafast optical spectroscopy
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Steven Cundiff
University of Michigan United States of America
ultrafast spectroscopy
ultrafast optics
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Ahmed Hassanein
Purdue University United States of America
extreme ultraviolet lithography
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Valeryi Sizyuk
Purdue University United States of America
extreme ultraviolet lithography
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Bill Brocklesby
University of Southampton United Kingdom
extreme ultraviolet spectroscopy
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Dominique Drouin
University of Sherbrooke Canada
electron beam lithography
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Dominique Drouin
University of Sherbrooke Canada
electron beam lithography
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Simone Dehm
Karlsruhe Institute of Technology Germany
electron-beam lithography
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Joel Yang
Singapore University of Technology and Design Singapore
electron-beam lithography
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Joel Yang
Singapore University of Technology and Design Singapore
electron-beam lithography
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Xu Fang
University of Southampton United Kingdom
extreme light manipulation
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Prashant Saxena
University of Glasgow United Kingdom
extreme deformation
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Claus Nielsen
Technical University of Denmark Denmark
photo lithography
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Jørgen Novaa
Technical University of Denmark Denmark
photo lithography
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Majken Becker
Technical University of Denmark Denmark
photo lithography
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Jan Braemer
Technical University of Denmark Denmark
photo lithography
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