Spatial Atomic Layer Deposition Professors in Global

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Sean Barry
Carleton University Canada
atomic layer deposition
thin film deposition
chemical vapor deposition
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Badrinath Veluri
Aarhus University Denmark
atomic layer deposition
chemical vapor deposition
physical vapor deposition
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Erwin Kessels
Eindhoven University of Technology Belgium
atomic layer deposition
plasma-enhanced chemical vapor deposition
atomic scale processing
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Pamburayi Mpofu
Linköping University Sweden
atomic layer deposition
chemical vapor deposition
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Adriana Creatore
Eindhoven University of Technology Belgium
atomic layer deposition
chemical vapor deposition
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Stephen Potts
University College London United Kingdom
atomic layer deposition
chemical vapour deposition
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Marin Alexe
University of Warwick United Kingdom
pulsed laser deposition
chemical solution deposition
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Zhenlong Li
Pennsylvania State University United States of America
spatial modeling
spatial computing
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Gregory Girolami
University of Illinois United States of America
chemical vapor deposition
metal-organic chemical vapor deposition
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Bora Karasulu
University of Warwick United Kingdom
atomic layer deposition
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Sophie Pain
University of Warwick United Kingdom
atomic layer deposition
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Harm Knoops
Eindhoven University of Technology Belgium
atomic layer deposition
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Marcel Verheijen
Eindhoven University of Technology Belgium
atomic layer deposition
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Suzanne Mohney
Pennsylvania State University United States of America
atomic layer deposition
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Neil Dasgupta
University of Michigan United States of America
atomic layer deposition
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Jonathan Emery
Northwestern University United States of America
atomic layer deposition
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Ageeth Bol
University of Michigan United States of America
atomic layer deposition
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Xin Cui
University of New South Wales Australia
atomic layer deposition
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Ludmilla Steier
University of Oxford United Kingdom
atomic layer deposition
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B Shong
Hongik University South Korea
atomic layer deposition
atomic layer etching
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James Engstrom
Cornell University Netherlands
atomic layer deposition
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