Atomic Layer Etching Professors in Global

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B Shong
Hongik University South Korea
atomic layer etching
atomic layer deposition
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Erwin Kessels
Eindhoven University of Technology Belgium
atomic layer deposition
atomic scale processing
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Austin Minnich
California Institute of Technology United States of America
atomic layer etching
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Arne Renz
University of Warwick United Kingdom
atomic layer processing
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Luiz Aguinsky
University of Glasgow United Kingdom
atomic layer processing
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Nuh Gedik
Massachusetts Institute of Technology United States of America
atomically layered materials
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Gerrit Kroesen
Eindhoven University of Technology Belgium
plasma etching
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Mathieu De Lafontaine
University of Ottawa Canada
plasma etching
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Ruggero Verre
Chalmers University of Technology Sweden
plasma etching
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Mark Horn
Pennsylvania State University United States of America
plasma etching
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Bora Karasulu
University of Warwick United Kingdom
atomic layer deposition
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Sophie Pain
University of Warwick United Kingdom
atomic layer deposition
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Marcel Verheijen
Eindhoven University of Technology Belgium
atomic layer deposition
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Neil Dasgupta
University of Michigan United States of America
atomic layer deposition
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Xin Cui
University of New South Wales Australia
atomic layer deposition
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Ageeth Bol
University of Michigan United States of America
atomic layer deposition
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Badrinath Veluri
Aarhus University Denmark
atomic layer deposition
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James Engstrom
Cornell University Netherlands
atomic layer deposition
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Peide Ye
Purdue University United States of America
atomic layer deposition
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Dmitri Koustov
Texas A&M University United States of America
etching
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Pamburayi Mpofu
Linköping University Sweden
atomic layer deposition
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