Vapor Deposition Professors in Global

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Badrinath Veluri
Aarhus University Denmark
physical vapor deposition
chemical vapor deposition
atomic layer deposition
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Sean Barry
Carleton University Canada
chemical vapor deposition
thin film deposition
atomic layer deposition
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John Ekerdt
University of Texas at Austin United States of America
chemical vapor deposition
metalorganic chemical vapor deposition
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Gregory Girolami
University of Illinois United States of America
chemical vapor deposition
metal-organic chemical vapor deposition
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Pamburayi Mpofu
Linköping University Sweden
chemical vapor deposition
atomic layer deposition
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Adriana Creatore
Eindhoven University of Technology Belgium
chemical vapor deposition
atomic layer deposition
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Jonas Sundqvist
Linköping University Sweden
sustainable chemical vapor deposition
thin film deposition
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Stephen Potts
University College London United Kingdom
chemical vapour deposition
atomic layer deposition
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Erwin Kessels
Eindhoven University of Technology Belgium
plasma-enhanced chemical vapor deposition
atomic layer deposition
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Marin Alexe
University of Warwick United Kingdom
chemical solution deposition
pulsed laser deposition
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Hans Högberg
Linköping University Sweden
vapor deposition
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Grzegorz Greczynski
Linköping University Sweden
physical vapor deposition
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David Paine
Brown University United States of America
physical vapor deposition
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Amir Mirzaei
Western University Canada
physical vapor deposition
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Amir Mirzaei
Western University Canada
physical vapor deposition
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Behrad Gholipour
University of Alberta Canada
physical vapor deposition
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Geoffrey Hyett
University of Southampton United Kingdom
chemical vapor deposition
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Philip Martin
University of Manchester United Kingdom
chemical vapor deposition
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Owen Smith
University of California Los Angeles United States of America
chemical vapor deposition
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Michael Frenklach
University of California, Berkeley United States of America
chemical vapor deposition
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Knud Mørch
Technical University of Denmark Denmark
chemical vapor deposition
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