Reactive Plasma Etching Professors in Global

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Roderick Boswell
Australian National University Australia
plasma processing
radiofrequency plasmas
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Robert Goldston
Princeton University United States of America
plasma heating
experimental plasma physics
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Robert Davis
Carnegie Mellon University United States of America
reactive plasma etching
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Ruggero Verre
Chalmers University of Technology Sweden
plasma etching
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Gerrit Kroesen
Eindhoven University of Technology Belgium
plasma etching
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Mark Horn
Pennsylvania State University United States of America
plasma etching
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Mathieu De Lafontaine
University of Ottawa Canada
plasma etching
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Henri Jansen
Technical University of Denmark Denmark
plasma etching physics
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B Shong
Hongik University South Korea
atomic layer etching
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Austin Minnich
California Institute of Technology United States of America
atomic layer etching
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Dmitri Koustov
Texas A&M University United States of America
etching
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Philip Hill
Michigan State University United States of America
plasma cutting
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David Staack
Texas A&M University United States of America
plasma-enhanced materials processing
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Mark Kushner
University of Michigan United States of America
plasma photochemical materials processing
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Mark Kushner
University of Michigan United States of America
plasma photochemical materials processing
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Paul May
University of Bristol United Kingdom
dry etching
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John Foster
University of Michigan United States of America
environmental plasma processing
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John Foster
University of Michigan United States of America
environmental plasma processing
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Timothy Grotjohn
Michigan State University United States of America
plasma-assisted materials processing
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Michael Lieberman
University of California, Berkeley United States of America
plasma-assisted materials processing
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Ali Mesbah
University of California, Berkeley United States of America
plasma processing
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