Thin Film Deposition Characterisation Professors in Global

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Sean Barry
Carleton University Canada
thin film deposition
thermal characterization
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Marin Alexe
University of Warwick United Kingdom
characterization of metal oxide thin films
thin film growth
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Andreas Schueler
École Polytechnique Fédérale de Lausanne Switzerland
optical properties of thin films
thin film technologies
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Jens Harting
Friedrich-Alexander-Universität Erlangen-Nürnberg Germany
physics of thin films
modeling thin films
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Teng Lu
Australian National University Australia
optical properties characterization
thin-film growth
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Xinyuan Wu
University of New South Wales Australia
thin film deposition characterisation
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Jens Birch
Linköping University Sweden
thin film characterization
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Joëlle Margot
Université de Montréal Canada
thin film deposition
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Becky Peterson
University of Michigan United States of America
thin film deposition
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Marek Skowronski
Carnegie Mellon University United States of America
thin film deposition
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Shona Mcnab
University of New South Wales Australia
thin film deposition
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Jonas Sundqvist
Linköping University Sweden
thin film deposition
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Hazel Assender
University of Oxford United Kingdom
thin film deposition
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Bernard Dam
Delft University of Technology Netherlands
thin film deposition
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Adam Wojcik
University College London United Kingdom
thin film deposition
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Mark Horn
Pennsylvania State University United States of America
thin film deposition
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Daniel Lundin
Linköping University Sweden
thin film deposition
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Adrienne Stiff-roberts
Duke University Singapore
thin-film deposition
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Shuolong Yang
University of Chicago United States of America
thin-film deposition
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Jian-min Zuo
Monash University Australia
thin-films nanostructures characterization
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Afsaneh Edrisy
University of Windsor Canada
mechanical characterization of thin films
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