Ion Assisted Deposition Professors in Global

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Gary Was
University of Michigan United States of America
ion-assisted deposition
ion implantation
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Rob Elliman
Australian National University Australia
ion-implantation
ion-beam modification
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Sean Barry
Carleton University Canada
atomic layer deposition
thin film deposition
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Badrinath Veluri
Aarhus University Denmark
atomic layer deposition
physical vapor deposition
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Marin Alexe
University of Warwick United Kingdom
pulsed laser deposition
chemical solution deposition
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Stephen Cox
University of Cambridge United Kingdom
adsorption of ions
aqueous ion solvation
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Marco Neumaier
Karlsruhe Institute of Technology Germany
ion spectroscopy
ion chemistry
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Grzegorz Greczynski
Linköping University Sweden
physical vapor deposition
ion
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Qiaoqin Yang
University of Saskatchewan Canada
plasma ion beam deposition
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Michael Nastasi
Texas A&M University United States of America
ion irradiation
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Melissa Passarelli
Concordia University Canada
matrix-assisted laser desorption ionization
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Chris Pawley
Maastricht University Netherlands
ion irradiation
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Keith Stolzenbach
University of California Los Angeles United States of America
atmospheric deposition
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Silvan Kretschmer
Technical University of Denmark Denmark
ion irradiation
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Suzanne Mohney
Pennsylvania State University United States of America
atomic layer deposition
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Lincoln Lauhon
Northwestern University United States of America
atomic layer deposition
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Ageeth Bol
University of Michigan United States of America
atomic layer deposition
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Erwin Kessels
Eindhoven University of Technology Belgium
atomic layer deposition
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Stephen Potts
University College London United Kingdom
atomic layer deposition
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Felipe Kremer
Australian National University Australia
ion implantation
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James Goldman
Columbia University United States of America
amyloid deposition
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